Structure of thermal resistive layer and the method of forming the same

ABSTRACT

The prevent invention discloses a structure of thermal resistive layer and the method of forming the same. The thermal resistive structures, formed on a plastic substrate, comprises a porous layer, formed on said plastic substrate, including a plurality of oxides of hollow structure, and a buffer layer, formed on said porous layer, wherein said porous layer can protect said plastic substrate from damage caused by the heat generated during manufacturing process. With the structure and method disclosed above, making a thin film transistor and forming electronic devices on the plastic substrate in the technology of Low Temperature PolySilicon, i.e. LTPS, without changing any parameters is easy to carry out.

FIELD OF THE INVENTION

The present invention relates to a structure of thermal resistive layerand the method of forming the same. More particularly, the inventionrelates to utilize a plurality of oxides of hollow structure to form athermal resistive layer on a plastic substrate to prevent the substratefrom damage caused by the heat generated during manufacturing process.

BACKGROUND OF THE INVENTION

There are two important aspects while developing the future flatdisplay, one is how to manufacture a flexible, light, and thin displaypanel, and the other is how to manufacture electronic elements withhigher electrons mobility and higher response speed for display panel.But the conventional flat displays are using the glass material as basesubstrates, which is superior in large area manufacturing and massproduction; however, the feature of light, thin and flexible isdifficult to be put into practice for glass substrate, therefore,undoubtedly, there is no better way to overcome the drawback aboveunless find an appropriate material. As to the other aspect, LowTemperature PolySilicon, i.e. LTPS technology, can achieve theobjective; therefore, the thin film transistors formed by process ofLTPS gradually becomes the main stream to be substituted for the processforming amorphous thin film transistors.

Among the materials nominated for the purpose to make a flexible, light,and thin display, plastic substrate is substantially win the engineers'gaze, nevertheless, the plastic substrate can't withstand the damagecaused by heat generated during the manufacturing process in LTPSmanufacturing process. This is because, during such process, a laserannealing with processing temperature more than 600-Celsius degree,which is almost higher than the glass transition temperature of plasticsubstrate, is necessary to be utilized to transform the amorphoussilicon into poly-crystalline silicon.

Although plastic substrates are not capable of bearing such hightemperature, overall speaking, compared with other materials, theplastic substrates still have many merits that engineers can't give up;therefore, there are still many efforts that scientists and engineersdedicate to overcome such as U.S. Pat. No. 5,817,550 and U.S. Pat. No.6,680,485. In the U.S. Pat. No. 5,817,550, it disclosed a methodutilizing a low energy laser, which is to form poly-crystalline siliconon a plastic substrate. In such method, at first, a silicon dioxide isformed on a plastic substrate, and then an amorphous layer was depositedon said silicon dioxide layer. Subsequently, a short-pulse XeCl ExcimerLaser (308 nm) is used to transform said amorphous silicon layer intopoly-crystalline silicon in no more than 100 ns. Another U.S. Pat. No.6,680,485 discloses a method utilizing a low energy laser to formpoly-crystalline silicon on a low-temperature plastic substrate, whereina specific thickness around 0.1 to 5.0 micrometer of silicon dioxide isformed, and then a specific thickness around 10 to 500 nanometer isformed on said silicon dioxide layer. Subsequently, a short-pulse XeClExcimer Laser (308 nm) is used to transform said amorphous silicon layerinto poly-crystalline silicon with processing temperature no more than250-Celsius degree.

Summarizing the prior arts described above, a list of drawbacks wasconcluded as following:

-   -   (1) The grain size of poly-crystalline silicon will be affected        by lower the energy of laser and shorten the annealing time, and        then characteristics of elements formed on plastic substrate        will be further influenced.    -   (2) The prior arts disclose a step to form a silicon dioxide on        the plastic substrate; however, forming silicon dioxide is        time-consuming so that throughput of mass production will be        affected. For example, it will spend 30 minutes to 40 minutes        forming 4-micrometer silicon dioxide layer.    -   (3) Meanwhile, although the better isolation can be achieved by        thicker oxidized layer, the brittle characteristic of the        thicker oxidized layer can also leads to easy chapping and easy        fragile that result in difficulty to control the manufacturing        process.        Hence, it is necessary to develop a structure of thermal        resistive layer for plastic substrate and manufacturing method        thereof to overcome the drawbacks of the prior arts.

SUMMARY OF THE INVENTION

The main object of the present invention is to provide a structure ofthermal resistive layer and the method of forming the same, utilizingoxides of hollow structure to form a thermal resistive layer on aplastic substrate, to increase the capability of heatproof, so as toachieve the objective of forming PolySilicon thin film on the plasticsubstrate.

A further object of the present invention is to provide a structure ofthermal resistive layer and the method of forming the same, utilizingoxides of hollow structure formed on a plastic substrate, so as toachieve the objective of making thin film transistor flat display withcharacteristics of tiny, light, thin and flexible.

Another object of the present invention is to provide a structure ofthermal resistive layer and the method of forming the same, making highefficiency electronic elements, so as to lower manufacturing cost.

Another further object of the present invention is to provide astructure of thermal resistive layer and the method of forming the same,a porous layer is formed to smooth the surface of the plastic substrate.

For the purpose to achieve the objectives listed above, the preventinvention discloses a structure of thermal resistive layer, formed on aplastic substrate, comprises a porous layer, formed on said plasticsubstrate, including a plurality of oxides of hollow structure, and abuffer layer, formed on said porous layer, wherein said porous layer canprotect said plastic substrate from damage caused by the heat generatedduring manufacturing process. With the structure and method disclosedabove, making a thin film transistor and forming electronic elements onthe plastic substrate in the technology of Low Temperature PolySilicon,i.e. LTPS, without changing any parameters is easy to carry out.

For the purpose to achieve the objectives listed above, the preventinvention discloses a method for forming a structure of thermalresistive layer on a plastic substrate comprising the steps of:

-   -   forming a plurality of oxides of hollow structure on an anodized        template;    -   removing said anodized template;    -   forming a porous layer by coating said plurality of oxides of        hollow structure on said plastic substrate; and    -   forming a buffer layer on said porous layer.

On the other hand, for the purpose to achieve the objectives listedabove, the prevent invention discloses another method for forming astructure of thermal resistive layer on a plastic substrate comprisingthe steps of:

-   -   forming a material layer on said plastic substrate;    -   transforming said material layer into a porous template layer        with a specific thickness by anodizing ; and    -   forming a buffer layer on said porous template layer.

BRIEF DESCRIPTION OF THE DRAWINGS

The drawings, incorporated into and form a part of the disclosure,illustrate the embodiments and method related to this invention and willassist in explaining the detail of the invention.

FIG. 1A is a cross-section view illustrating a preferred embodimentaccording to the principle of the invention.

FIG. 1B is a cross-section view illustrating another preferredembodiment according to the principle of the invention.

FIG. 2A is a schematic view illustrating the sphere shape of oxide ofhollow structure.

FIG. 2B is a schematic view illustrating the disk shape of oxide ofhollow structure.

FIG. 2C is a schematic view illustrating the column shape of oxide ofhollow structure.

FIG. 3A through FIG. 3D are cross-section views illustrating the formingflow of a preferred embodiment according to the principle of theinvention.

FIG. 4A to FIG. 4F are cross-section views illustrating the forming flowof another preferred embodiment according to the principle of theinvention.

FIG. 5A to FIG. 5F are cross-section views illustrating the flow forminga type of top gate transistor on a structure of thermal resistive layerformed on a plastic substrate.

FIG. 6A to FIG. 6F are cross-section views illustrating the flow forminga type of bottom gate transistor on a structure of thermal resistivelayer formed on a plastic substrate.

DESCRIPTION OF THE PREFERRED EMBODIMENT

Referring to FIG. 1A, the figure is a cross-section view illustrating apreferred embodiment according to the principle of the invention. Theprevent invention discloses a structure of thermal resistive layer 1comprising a plastic substrate 11, a porous layer 12, including aplurality of oxides of hollow structure 121, and a buffer layer 13,which is silicon dioxide in this embodiment. The oxides of hollowstructure 121 are materials selected from a group consisting of siliconoxide, titanium oxide, zinc oxide, and aluminum oxide and the shape ofsaid oxides of hollow structure 121 are structures selected from a groupconsisting of sphere 32 a, as illustrated in FIG. 2A, disk 32 b, asillustrated in FIG. 2B, column 32 c, as illustrated in FIG. 2C, whereindistribution of said column shape 32 c of said oxides of hollowstructure 121 can be selected from a group consisting of standing andlying flat on said plastic substrate. By means of utilizing said porouslayer 12, the damage, caused by heat generated from manufacturingprocess, to said plastic substrate 11 can be prevented.

Please continuing to refer to FIG. 1B, the figure is a cross-sectionview illustrating another preferred embodiment according the principleof the invention. The embodiment according to this invention discloses astructure of thermal resistive layer 2 comprising a plastic substrate21, a conductive layer 22, substantially a material of indium tin oxide(ITO) in this embodiment to increase uniformity of a porous layer 24that will be mentioned later, formed on said plastic substrate 21, atemplate layer 23, a material selected from a group consisting ofsilicon, titanium, zinc and aluminum, formed on said conductive layer22, a porous layer 24, including a plurality of oxides of hollowstructure 241 and being selected from a group consisting of siliconoxide, zinc oxide, titanium oxide, and aluminum oxide, formed on saidtemplate layer 23, a planarization layer 25, formed on said porous layer24 so as to smooth the surface of said porous layer 24, and a bufferlayer 26, substantially a material of silicon dioxide, formed on saidplanarization layer 25, which is a material selected from the groupconsisting of polymer, and inorganic materials.

From the content described above, it is easy to understand the structureof thermal resistive layer according to the present invention. In thefollowing description, the manufacturing method to form said structureis disclosed in detail.

Please referring to the FIG. 3A through FIG. 3D, the figures arecross-section views illustrating the forming flow of a preferredembodiment according to the principle of the invention. The process,forming a structure of thermal resistive layer, comprising the followingsteps starting from the step shown in FIG. 3A, an anodized template 41including a plurality of mold holes 41 a is provided, wherein saidanodized template is a material selected from the group consisting ofsilicon, titanium, zinc and aluminum. Then the process continues to thestep shown in FIG. 3B, wherein a plurality of oxides of hollow structure43 are formed in said plurality of mold holes 41 a of said anodizedtemplate 41 through the process of electrochemistry, chemical vapordeposition (CVD), or sol-gel. Said oxide of hollow structure is amaterial selected from-the group consisting of silicon oxide, titaniumoxide, zinc oxide, and aluminum oxide and the shape of said oxide ofhollow structure is selected from the group consisting of sphere,column, and disk. Afterwards, said anodized template 41 is removed, asshown in FIG. 3C, by etching. The process continues to the step shown inFIG. 3D, wherein said oxides of hollow structure 43 are processed bysol-gel and then are coated on said plastic substrate 44 by spin coatingto form a porous layer 45. Finally, a buffer layer 46 is formed on saidporous layer 45, wherein said buffer layer is substantially a siliconoxide.

Please referring to the FIG. 4A through FIG. 4F, the figures arecross-section views illustrating the forming flow of another preferredembodiment according to the principle of the invention. For more detail,the process, forming a structure of thermal resistive layer, isillustrated and explained in the following description. The processstarts from providing a plastic substrate 51, shown in FIG. 4A, then, asshown in FIG. 4B, a conductive layer 52 formed on said plastic substrate51 is implemented. In this embodiment, said conductive layer 52 issubstantially a material of indium tin oxide (ITO). The process proceedsto the step shown in FIG. 4C, wherein a material layer 53 is formed onsaid conductive layer 52. Said material layer 53 is a material selectedfrom the group consisting of silicon, titanium, zinc, and aluminum;thereafter, as shown in FIG. 4D, said material layer 53 is transformedinto a porous template layer 54 with a plurality of oxides of hollowstructure 54 a by anodizing, wherein said oxides of hollow structure 54a are material selected from the group consisting of silicon oxide,titanium oxide, zinc oxide, and aluminum oxide and the shape of saidoxides of hollow structure 54 a are selected from the group consistingof sphere, column, and disk. In order to increase adhesion of saidoxides of hollow structure 54 a, a plate 54 b, transformed from saidmaterial layer 53 by anodizing, with a specific thickness is kept. Theprocess continue to the step shown in FIG. 4E, wherein a planarizationlayer 56, a material selected from the group consisting of polymer, andinorganic material, is formed through spin coating on said poroustemplate layer 54. Finally, as illustrated in FIG. 4F, said buffer layer57 is formed on said planarization layer 56, wherein said buffer layer57 is substantially a silicon oxide. The purpose to form said conductivelayer 52 is to increase uniformity of said porous template layer 54 andto ensure said material layer 53 to be completely oxidized duringanodizing.

In the following explanation, two examples are illustrated to helpunderstand how to form a poly-crystalline silicon thin film transistoron plastic substrate.

Please referring to FIG. 5A through FIG. 5F, these figures arecross-section views illustrating the flow forming a type of top gatetransistor on a structure of thermal resistive layer formed on a plasticsubstrate. The example illustrates the progress of the flow to form atop gate transistor. As illustrated in FIG. 5A, a porous layer 62,having surface roughness under 5 nanometer and also including aplurality of oxides of hollow structure 62 a, is formed on a plasticsubstrate 61 so as to prevent said plastic substrate 61 from heat damagecaused during processing and, on the other hand, to smooth the surfaceof said plastic substrate 61 so that electronic devices can bemanufactured without any problem. Afterwards, as illustrated in FIG. 5B,a buffer layer 63 is formed on said porous layer 62, and then anamorphous silicon layer 64 is formed on said buffer layer 63. Next, asshown in FIG. 5C, said amorphous silicon layer 64 is transformed intopoly-crystalline silicon layer 65 through the laser annealing 9.

Referring to FIG. 5D, by means of ion implanting, a pair of source/drainregion 65 a is formed by selecting N-type doped or P-type doped on saidpoly-crystalline silicon layer 65. Thereafter, as illustrated in FIG.5E, a gate dielectric layer 66 is deposited and then a gate metalelectrode 67 is formed. Afterwards, as shown in FIG. 5F, an interlayer68 is formed and then contact holes opposite to the said pair ofsource/drain regions 65 a are formed so that metal interconnect 69 canbe formed. The purpose of forming said buffer layer 63 is to assistnucleation reaction of silicon seeds to be formed easily on said bufferlayer 63 so that forming said amorphous silicon layer 64 would becomemore smoothly, and to prevent the impurities in the layers formed beforesaid buffer layer 63 from penetrating into said amorphous layer 64.

Please referring to FIG. 6A through FIG. 6F, these figures arecross-section views illustrating the flow forming a type of bottom gatetransistor on a structure of thermal resistive layer formed on a plasticsubstrate. The following example illustrated the progress of the flow toform a bottom gate transistor. As illustrated in FIG. 6A, a porous layer72, having surface roughness under 5 nanometer and also including aplurality of oxides of hollow structure 72 a, is formed on a plasticsubstrate 71 to prevent said plastic substrate 71 from heat damagecaused by processing and, on the other hand, to smooth the surface ofsaid plastic substrate 71 so that electric devices can be manufacturedwithout any problem. Afterwards, as illustrated in FIG. 6B, a bufferlayer 73 is formed on said porous layer 72.

In the next step, as shown in FIG. 6C, a gate metal electrode layer 74is formed, and then a gate dielectric layer 75 is deposited on said gatemetal electrode layer 74. Afterwards an amorphous layer 76 is formed onsaid gate dielectric layer 75. Referring to FIG. 6D, said amorphoussilicon layer 76 is transformed into poly-crystalline silicon layer 77through the laser annealing 9. Subsequently, as illustrated in FIG. 6E,by means of ion implanting, pair of source/drain regions 77 a are formedby selecting N-type doped or P-type doped on said poly-crystallinesilicon layer 77. Thereafter, as shown in FIG. 6F, an interlayer 78 isformed subsequently, and then contact holes opposite to the said pair ofsource/drain regions 77 a are formed so that metal interconnect 79 canbe formed. The purpose of forming said buffer layer 73 is to assistnucleation reaction of silicon seeds to be formed easily on said bufferlayer 73 so that forming said amorphous silicon layer 76 would becomemore smoothly, and to prevent the impurities in the layers formed beforesaid buffer layer 73 from penetrating into said amorphous layer 76.

While the present invention has been described and illustrated hereinwith reference to the preferred embodiment thereof, it will beunderstood by those skilled in the art that various changes in form anddetails may be made therein without departing from the spirit and thescope of the invention.

1. A structure of thermal resistive layer formed on a plastic substrate,comprising: a porous layer, formed on said plastic substrate, includinga plurality of oxides of hollow structure; and a buffer layer, formed onsaid porous layer; wherein said porous layer can protect said plasticsubstrate from damage caused by the heat generated during manufacturingprocess.
 2. The structure according to claim 1, wherein said oxide ofhollow structure is a material selected from the group consisting ofsilicon oxide, titanium oxide, zinc oxide, and aluminum oxide.
 3. Thestructure according to claim 1, wherein the shape of said oxide ofhollow structure is selected from the group consisting of sphere,column, and disk.
 4. The structure according to claim 3, wherein thedistribution of said oxides of hollow structure in column shape arestanding on said plastic substrate.
 5. The structure according to claim3, wherein the distribution of said oxides of hollow structure in columnshape are lying flat on said plastic substrate.
 6. The structureaccording to claim 1, further comprising a template layer, formedbetween said plastic substrate and said porous layer, wherein saidtemplate layer is a material selected from the group consisting ofsilicon, titanium, zinc, and aluminum.
 7. The structure according toclaim 6, further comprising a conductive layer, formed between saidplastic substrate and said template layer.
 8. The structure according toclaim 7, wherein said conductive layer is substantially an indium tinoxide.
 9. The structure according to claim 7, further comprising aplanarization layer, formed between said porous layer and said bufferlayer.
 10. The structure according to claim 9, wherein saidplanarization layer is a material selected from the group consisting ofpolymer, and inorganic materials.
 11. The structure according to claim1, wherein said buffer layer is substantially a silicon oxide.
 12. Thestructure according to claim 1, further comprising an amorphous layerformed on said buffer layer and said amorphous layer is transformed intopolycrystalline silicon layer through a heat process.
 13. A method forforming a structure of thermal resistive layer on a plastic substratecomprising the steps of: forming a plurality of oxides of hollowstructure on an anodized template; removing said anodized template;forming a porous layer by coating said plurality of oxides of hollowstructure on said plastic substrate; and forming a buffer layer on saidporous layer.
 14. The method according to claim 13, wherein said coatingprocess is accomplished by processing said oxides of hollow structurethrough the way of sol-gel and then coating on said plastic substrate byspin coating.
 15. The method according to claim 13, wherein saidanodized template is a material selected from the group consisting ofsilicon, titanium, zinc and aluminum.
 16. The method according to claim13, wherein said oxide of hollow structure is a material selected fromthe group consisting of silicon oxide, titanium oxide, zinc oxide, andaluminum oxide.
 17. The method according to claim 13, wherein the shapeof said oxide of hollow structure is selected from the group consistingof sphere, column, and disk.
 18. The method according to claim 13,wherein said buffer layer is substantially a silicon oxide.
 19. A methodfor forming a structure of thermal resistive layer on a plasticsubstrate comprising the steps of: forming a material layer on saidplastic substrate; transforming said material layer into a poroustemplate layer with a specific thickness by anodizing ; and forming abuffer layer on said porous template layer.
 20. The method according toclaim 19, wherein said buffer layer is substantially a silicon oxide.21. The method according to claim 19, further comprising forming aplanarization layer between said buffer layer and said porous templatelayer.
 22. The method according to claim 21, wherein said planarizationlayer is a material selected from the group consisting of polymer, andinorganic material.
 23. The method according to claim 19, wherein saidmaterial layer is a material selected from the group consisting ofsilicon, titanium, zinc, and aluminum.
 24. The method according to claim19, wherein said porous template layer further comprises a plurality ofoxides of hollow structure which are material selected from the groupconsisting of silicon oxide, titanium oxide, zinc oxide, and aluminumoxide.
 25. The method according to claim 24, wherein the shape of saidoxide of hollow structure is selected from the group consisting ofsphere, column, and disk.
 26. The method according to claim 19, furthercomprising a conductive layer formed between said plastic substrate andsaid material layer.
 27. The method according to claim 26, wherein saidconductive layer is substantially an indium tin oxide.